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Residual stress measurement on TiN thin films by combing nanoindentation and average X-ray strain (AXS) method Journal article
Surface and Coatings Technology, 2015,Volume: 280,Page: 43-49
Authors:  Wang A.-N.;  Huang J.-H.;  Hsiao H.-W.;  Yu G.-P.;  Chen H.
Favorite |  | TC[WOS]:13 TC[Scopus]:15 | Submit date:2019/04/08
Average X-ray strain (AXS)  Cos2αsin2ψ method  Nanoindentation  Residual stress  TiN thin film  
Nanohardness of nanocrystalline TiN thin films Journal article
Surface and Coatings Technology, 2006,Volume: 200,Issue: 12-13,Page: 3868-3875
Authors:  Ma C.-H.;  Huang J.-H.;  Chen H.
Favorite |  | TC[WOS]:78 TC[Scopus]:81 | Submit date:2019/04/08
Nanohardness  Residual stress  Texture  TiN  
X-Ray photoelectron spectroscopy characterization of reactively sputtered Ti-B-N thin films Journal article
Surface and Coatings Technology, 2004,Volume: 187,Issue: 1,Page: 98-105
Authors:  Lu Y.H.;  Zhou Z.F.;  Sit P.;  Shen Y.G.;  Li K.Y.;  Chen H.
Favorite |  | TC[WOS]:36 TC[Scopus]:45 | Submit date:2019/04/08
Boron  Hardness  Microstructure  Thin films  Ti-B-N  X-Ray photoelectron spectroscopy (XPS)