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X-Ray photoelectron spectroscopy characterization of reactively sputtered Ti-B-N thin films Journal article
Surface and Coatings Technology, 2004,Volume: 187,Issue: 1,Page: 98-105
Authors:  Lu Y.H.;  Zhou Z.F.;  Sit P.;  Shen Y.G.;  Li K.Y.;  Chen H.
Favorite |  | TC[WOS]:36 TC[Scopus]:45 | Submit date:2019/04/08
Boron  Hardness  Microstructure  Thin films  Ti-B-N  X-Ray photoelectron spectroscopy (XPS)