Nanohardness of nanocrystalline TiN thin films
Ma C.-H.4; Huang J.-H.2; Chen H.4
Source PublicationSurface and Coatings Technology
AbstractTiN films were prepared by ion beam assisted deposition (IBAD) method under different temperatures and ion energies. Microstructure characterization by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning and transmission electron microscopy (SEM and TEM) confirmed that the nitride films were nanocrystalline in size and composed of grains with grain sizes ∼20 nm. Textures of the films were studied by XRD pole figure measurements. Residual stress was determined by the modified sin method using grazing incidence XRD. Hardness of the thin films was measured by nanoindentation. It is found that nanoindentation measurement cannot reflect the variation of residual stress. Nanohardness of the samples also displayed insignificant relationship with texture. Since the dislocation activity is retarded due to nanograin structure, the geometrical strengthening via texture control or Hall-Petch relationship is no longer applicable. Therefore, grain rotation or grain boundary sliding may be the deformation mechanisms for nanocrystalline thin film. The contradictory relationships between hardness and preferred orientation were also clarified. © 2004 Elsevier B.V. All rights reserved.
KeywordNanohardness Residual stress Texture TiN
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Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Tunghai University
2.National Tsing Hua University
3.City University of Hong Kong
4.University of Illinois at Urbana-Champaign
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Ma C.-H.,Huang J.-H.,Chen H.. Nanohardness of nanocrystalline TiN thin films[J]. Surface and Coatings Technology,2006,200(12-13):3868-3875.
APA Ma C.-H.,Huang J.-H.,&Chen H..(2006).Nanohardness of nanocrystalline TiN thin films.Surface and Coatings Technology,200(12-13),3868-3875.
MLA Ma C.-H.,et al."Nanohardness of nanocrystalline TiN thin films".Surface and Coatings Technology 200.12-13(2006):3868-3875.
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