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Effects of nitrogen content on nanostructure evolution, mechanical behaviors and thermal stability in Ti-B-N thin films
Lu Y.H.2; Shen Y.G.1; Li K.Y.1; Chen H.1
2006-10-05
Source PublicationSurface and Coatings Technology
ISSN02578972
Volume201Issue:3-4Pages:1228-1235
AbstractSeveral thin films of Ti-B-N with different N contents were deposited at 500 °C on Si (100) substrate by reactive unbalanced dc magnetron sputtering, followed by vacuum annealed at 600, 800 and 1000 °C, respectively. The effect of nitrogen content on microstructure, mechanical behaviors and thermal stability was investigated by X-ray diffraction (XRD), plan-view high resolution transmission electron microscopy (HRTEM) and X-ray photoelectron spectroscopy (XPS) and microindentation methods. The results indicated that nitrogen content had a great effect on phase configuration, microstructure and the corresponding mechanical behaviors. An amorphous (a-) Ti-TiB compound thin film which consists of Ti and TiB with a low hardness value was formed without nitrogen doped. Addition of small amount of nitrogen (10 at.% N in this study) produced nanocomposite nanocrystalline (nc-) Ti(N)/a-TiB thin films by way of activating phase segregation. Increasing nitrogen content accelerated further segregation of phase, accompanied with formation of nanocomposite nc-TiN/a-TiB thin films and fast increase of microhardness value. A maximum microhardness value of about 52 GPa was obtained at TiBN. Further increase of N content accelerated formation of BN bonding, followed by formation of nc-TiN/a-TiB/a-BN thin films and fast decrease of microhardness value. The residual stress was not consistent with the microhardness, and showed linear increase with increasing N content. The thermal stability of Ti-B-N thin films strongly depended on microstructure and phase configuration. A high thermal stability usually occurred at an optimum composition which had a high microhardness value. © 2006 Elsevier B.V. All rights reserved.
KeywordMechanical behaviors Microstructure Nitrogen Thermal stability Ti-B-N thin films
DOI10.1016/j.surfcoat.2006.01.045
URLView the original
Language英語
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Cited Times [WOS]:14   [WOS Record]     [Related Records in WOS]
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.City University of Hong Kong
2.University of Science and Technology Beijing
Recommended Citation
GB/T 7714
Lu Y.H.,Shen Y.G.,Li K.Y.,et al. Effects of nitrogen content on nanostructure evolution, mechanical behaviors and thermal stability in Ti-B-N thin films[J]. Surface and Coatings Technology,2006,201(3-4):1228-1235.
APA Lu Y.H.,Shen Y.G.,Li K.Y.,&Chen H..(2006).Effects of nitrogen content on nanostructure evolution, mechanical behaviors and thermal stability in Ti-B-N thin films.Surface and Coatings Technology,201(3-4),1228-1235.
MLA Lu Y.H.,et al."Effects of nitrogen content on nanostructure evolution, mechanical behaviors and thermal stability in Ti-B-N thin films".Surface and Coatings Technology 201.3-4(2006):1228-1235.
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