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Study of the Electron Gas Behavior in an ECR Multipolar Plasma Source Conference paper
IEEE Conference Record - Abstracts. 1992 IEEE International Conference on Plasma, Tampa, FL, USA, USA, 1-3 June 1993
Authors:  P. Mak;  W. Tan;  F.C. Sze;  T.A. Grotjohn;  J. Asmussen
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The design and application of electron cyclotron resonance discharges Journal article
IEEE Transactions on Plasma Science, 1997,Volume: 25,Issue: 6,Page: 1196-1221
Authors:  Asmussen Jr. J.;  Grotjohn T.A.;  Mak P.;  Perrin M.A.
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Ecr microwave discharges  High-density plasma sources  Plasma processing  
Experimental investigation of the matching and impressed electric field of a multipolar electron cyclotron resonance discharge Journal article
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997,Volume: 15,Issue: 1,Page: 154-168
Authors:  Mak P.;  Asmussen J.
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Control of multipolar electron cyclotron resonance discharges using internal cavity impedance matching Journal article
Review of Scientific Instruments, 1994,Volume: 65,Issue: 5,Page: 1753-1756
Authors:  Asmussen J.;  Mak P.
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Evaluation of an end excited electron cyclotron resonance plasma source Conference paper
IEEE International Conference on Plasma Science, Santa Fe, NM, USA, USA, 6-8 June 1994
Authors:  Mak P.;  Asmussen J.
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Ion and neutral energies in a multipolar electron cyclotron resonance plasma source Conference paper
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Authors:  King G.;  Sze F.C.;  Mak P.;  Grotjohn T.A.;  Asmussen J.
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Investigation of the influence of electromagnetic excitation on electron cyclotron resonance discharge properties Conference paper
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Authors:  Mak P.;  King G.;  Grotjohn T.A.;  Asmussen J.
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