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Measurement of residual stress on TiN/Ti bilayer thin films using average X-ray strain combined with laser curvature and nanoindentation methods Journal article
MATERIALS CHEMISTRY AND PHYSICS, 2017,Volume: 199,Page: 185-192
Authors:  Lei, Soichan;  Huang, Jia-Hong;  Chen, Haydn
Favorite  |  View/Download:13/0  |  Submit date:2018/10/30
Ti interlayer  TiN  Residual stress  Average X-ray strain  Synchrotron X-ray