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Effect of oxygen partial pressure contents on the properties of al-doped ZnO thin films prepared by radio frequency sputtering Journal article
Journal of Ceramic Processing Research, 2011,Volume: 12,Issue: 2,Page: 150-154
Authors:  Hwang D.;  Ahn J.;  Hui K.;  Hui K.;  Son Y.
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Al-doped ZnO film  Magnetron sputtering  Oxygen partial pressure