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Development and Active Disturbance Rejection Control of a Compliant Micro-/Nanopositioning Piezostage with Dual Mode Journal article
IEEE Transactions on Industrial Electronics, 2014,Volume: 61,Issue: 3,Page: 1475
作者:  Tang H.;  Li Y.
收藏  |  浏览/下载:4/0  |  提交时间:2018/10/30
Active disturbance rejection control  atomic force microscope (AFM)  lever displacement amplifiers (LDAs)  micro-/nanopositioning system  plant uncertainties