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Effect of deposition temperature on the structural and surface properties of AlN by plasma enhanced atomic layer deposition Journal article
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2016,Volume: 45,Issue: 4
Authors:  Chen F.;  Fang X.;  Wang S.;  Niu S.;  Fang F.;  Fang D.;  Tang J.;  Wang X.;  Liu G.;  Wei Z.
Favorite | View/Download:9/0 | TC[WOS]:0 TC[Scopus]:0 | Submit date:2019/04/08
Aluminum nitride  Crystallization  Deposition temperature  Growth rate  Plasma enhanced atomic layer deposition  Surface roughness