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Role of oxygen pressure during pulsed laser deposition on the electrical and dielectric properties of antiferroelectric lanthanum-doped lead zirconate stannate titanate thin films Journal article
Journal of Applied Physics, 2004,Volume: 96,Issue: 1,Page: 569-574
Authors:  Yao Y.;  Lu S.G.;  Chen H.;  Zhai J.;  Wong K.H.
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Electrical characteristics of 25 nm Pr(ZrTi)O3 thin films grown on Si by metalorganic chemical vapor deposition Journal article
Journal of Applied Physics, 2000,Volume: 88,Issue: 4,Page: 2157-2159
Authors:  Lin C.H.;  Friddle P.A.;  Lu X.;  Chen H.;  Kim Y.;  Wu T.B.
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