UM
Residual stress measurement on TiN thin films by combing nanoindentation and average X-ray strain (AXS) method
Wang A.-N.1; Huang J.-H.1; Hsiao H.-W.1; Yu G.-P.1; Chen H.2
2015
Source PublicationSurface and Coatings Technology
ISSN02578972
Volume280Pages:43-49
AbstractIn our previous study, an average X-ray strain (AXS) method was proposed to improve the measurement accuracy of X-ray residual stress (XRS) and X-ray elastic constants (XECs) by increasing the sampling volume in X-ray diffraction (XRD). Using AXS and elastic constant determined by nanoindentation (E) to calculate XRS, the stress deviation from that measured by optical curvature technique (ORS) could be reduced to 3% for TiN coatings with thickness larger than 1.55μm. The purposes of this study were to further explore the lower limit of film thickness where the AXS method could be employed to accurately determine the residual stress using lab-XRD facilities, and to assess the feasibility to calculate XRS of thin films by combining AXS and E from thicker coatings (>1μm). TiN thin films on Si substrate with thickness ranging from 85nm to 2.5μm were selected as the model system. AXS was determined using cosαsinψ XRD technique at several rotational (ϕ) angles ranging from 0 to 180°, and the XRS was calculated by multiplying E with the AXS. The deviation of XRS from ORS was served as an indicator to validate the effectiveness of the AXS method. The results showed that AXS could be accurately measured down to a thickness of 350nm by using lab X-ray source; however, the resolution of AXS was not sufficient to differentiate the strain for a specimen with a thickness less than 160nm, which was mainly due to insufficient sampling volume. Moreover, the E measured following ISO 14577 standard procedures could be used for calculating XRS, if the film thickness was sufficiently large, 680nm in this study, such that substrate effect could be avoided. Two approaches were proposed for measuring the Young's modulus and Poisson's ratio of TiN thin films. The results also confirmed that the thickness limit of AXS method was about 350nm by comparing the resultant elastic constants with literature and experimental data.
KeywordAverage X-ray strain (AXS) Cos2αsin2ψ method Nanoindentation Residual stress TiN thin film
DOI10.1016/j.surfcoat.2015.08.059
URLView the original
Language英語
Fulltext Access
Citation statistics
Cited Times [WOS]:9   [WOS Record]     [Related Records in WOS]
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.National Tsing Hua University
2.Universidade de Macau
Recommended Citation
GB/T 7714
Wang A.-N.,Huang J.-H.,Hsiao H.-W.,et al. Residual stress measurement on TiN thin films by combing nanoindentation and average X-ray strain (AXS) method[J]. Surface and Coatings Technology,2015,280:43-49.
APA Wang A.-N.,Huang J.-H.,Hsiao H.-W.,Yu G.-P.,&Chen H..(2015).Residual stress measurement on TiN thin films by combing nanoindentation and average X-ray strain (AXS) method.Surface and Coatings Technology,280,43-49.
MLA Wang A.-N.,et al."Residual stress measurement on TiN thin films by combing nanoindentation and average X-ray strain (AXS) method".Surface and Coatings Technology 280(2015):43-49.
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Wang A.-N.]'s Articles
[Huang J.-H.]'s Articles
[Hsiao H.-W.]'s Articles
Baidu academic
Similar articles in Baidu academic
[Wang A.-N.]'s Articles
[Huang J.-H.]'s Articles
[Hsiao H.-W.]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Wang A.-N.]'s Articles
[Huang J.-H.]'s Articles
[Hsiao H.-W.]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.