UM
Influence of Zn/O ratio on structural, electrical and optical properties of ZnO thin films fabricated by plasma-assisted molecular beam epitaxy
Zhang B.3; Yao B.3; Wang S.3; Li Y.3; Shan C.3; Zhang J.3; Li B.3; Zhang Z.3; Shen D.3
2010-07-30
Source PublicationJournal of Alloys and Compounds
ISSN09258388
Volume503Issue:1Pages:155-158
AbstractHigh quality ZnO films were grown on c-plane sapphire (c-Al O) substrates by plasma-assisted molecular beam epitaxy (P-MBE). The influence of Zn/O ratio on the epitaxial growth of ZnO is investigated. Via adjusting Zn/O ratio, structural, electrical and optical properties of the ZnO thin films are significantly improved, and the highest quality ZnO film with the full width of half maximum (FWHM) of 0.05° at the (0 0 2) peak and electron mobility of 54 cm/V s is obtained at the Zn/O ratio of 1.03. When the Zn/O ratio is diverged from 1.03, the films exhibit rough surface with reticulated nanostructures. The formation mechanism of the ZnO nanostructure at non-stoichiometric condition is discussed. It is also found that both Zn-rich and O-rich samples show DX emission peak located at 3.362 eV in the PL-spectra. By using the photon energy of the DX and the Haynes rules, the ionization energy of the donor corresponding to the DX is calculated to be 36 meV, which implies that the DX is related to hydrogen donor. © 2010 Elsevier B.V. All rights reserved.
KeywordElectrical properties Optical properties Stoichiometric ZnO
DOI10.1016/j.jallcom.2010.04.220
URLView the original
Language英語
Fulltext Access
Citation statistics
Cited Times [WOS]:26   [WOS Record]     [Related Records in WOS]
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Chinese Academy of Sciences
2.Jilin University
3.Changchun Institute of Optics Fine Mechanics and Physics Chinese Academy of Sciences
Recommended Citation
GB/T 7714
Zhang B.,Yao B.,Wang S.,et al. Influence of Zn/O ratio on structural, electrical and optical properties of ZnO thin films fabricated by plasma-assisted molecular beam epitaxy[J]. Journal of Alloys and Compounds,2010,503(1):155-158.
APA Zhang B..,Yao B..,Wang S..,Li Y..,Shan C..,...&Shen D..(2010).Influence of Zn/O ratio on structural, electrical and optical properties of ZnO thin films fabricated by plasma-assisted molecular beam epitaxy.Journal of Alloys and Compounds,503(1),155-158.
MLA Zhang B.,et al."Influence of Zn/O ratio on structural, electrical and optical properties of ZnO thin films fabricated by plasma-assisted molecular beam epitaxy".Journal of Alloys and Compounds 503.1(2010):155-158.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhang B.]'s Articles
[Yao B.]'s Articles
[Wang S.]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhang B.]'s Articles
[Yao B.]'s Articles
[Wang S.]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhang B.]'s Articles
[Yao B.]'s Articles
[Wang S.]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.