| Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering | |
| Zhang X.L.2; Hui K.N.2; Hui K.S.1; Singh J.2 | |
| 2013-03-01 | |
| Source Publication | Materials Research Bulletin
 |
| ISSN | 00255408 |
| Volume | 48Issue:3Pages:1093-1098 |
| Abstract | ZnO thin films were deposited onto quartz substrates by radio frequency (RF) reactive magnetron sputtering using a Zn target. The structural and optical properties of the ZnO thin films were investigated comprehensively by X-ray diffraction (XRD), ultraviolet-visible and photoluminescence (PL) measurements. The effects of the oxygen content of the total oxygen-argon mixture and sputtering voltage in the sputtering process on the structural and optical properties of the ZnO films were studied systemically. The microstructural parameters, such as the lattice constant, crystallite size, stress and strain, were also calculated and correlated with the structural and optical properties of the ZnO films. In addition, the results showed that the crystalline quality of ZnO thin films improved with increasing O/Ar gas flow ratio from 2:8 to 8:2. XRD and PL spectroscopy revealed 800 V to be the most appropriate sputtering voltage for ZnO thin film growth. High-quality ZnO films with a good crystalline structure, tunable optical band gap as well as high transmittance could be fabricated easily by RF reactive magnetron sputtering, paving the way to obtaining cost-effective ZnO thin films transparent conducting oxides for optoelectronics applications. © 2012 Elsevier Ltd. All rights reserved. |
| Keyword | A. Oxides A. Thin films B. Sputtering D. Microstructure D. Optical properties |
| DOI | 10.1016/j.materresbull.2012.11.104 |
| URL | View the original |
| Language | 英語 |
| Fulltext Access | |
| Citation statistics | |
| Document Type | Journal article |
| Collection | University of Macau |
| Affiliation | 1.City University of Hong Kong 2.Pusan National University |
| Recommended Citation GB/T 7714 | Zhang X.L.,Hui K.N.,Hui K.S.,et al. Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering[J]. Materials Research Bulletin,2013,48(3):1093-1098. |
| APA | Zhang X.L.,Hui K.N.,Hui K.S.,&Singh J..(2013).Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering.Materials Research Bulletin,48(3),1093-1098. |
| MLA | Zhang X.L.,et al."Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering".Materials Research Bulletin 48.3(2013):1093-1098. |
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