Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering

doi:10.1016/j.materresbull.2012.11.104

	Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering
	Zhang X.L.2; Hui K.N.2; Hui K.S.1; Singh J.2
	2013-03-01
Source Publication	Materials Research Bulletin
ISSN	00255408
Volume	48 Issue:3 Pages:1093-1098
Abstract	ZnO thin films were deposited onto quartz substrates by radio frequency (RF) reactive magnetron sputtering using a Zn target. The structural and optical properties of the ZnO thin films were investigated comprehensively by X-ray diffraction (XRD), ultraviolet-visible and photoluminescence (PL) measurements. The effects of the oxygen content of the total oxygen-argon mixture and sputtering voltage in the sputtering process on the structural and optical properties of the ZnO films were studied systemically. The microstructural parameters, such as the lattice constant, crystallite size, stress and strain, were also calculated and correlated with the structural and optical properties of the ZnO films. In addition, the results showed that the crystalline quality of ZnO thin films improved with increasing O/Ar gas flow ratio from 2:8 to 8:2. XRD and PL spectroscopy revealed 800 V to be the most appropriate sputtering voltage for ZnO thin film growth. High-quality ZnO films with a good crystalline structure, tunable optical band gap as well as high transmittance could be fabricated easily by RF reactive magnetron sputtering, paving the way to obtaining cost-effective ZnO thin films transparent conducting oxides for optoelectronics applications. © 2012 Elsevier Ltd. All rights reserved.
Keyword	A. Oxides A. Thin films B. Sputtering D. Microstructure D. Optical properties
DOI	10.1016/j.materresbull.2012.11.104
URL	View the original
Language	英語
全文获取链接	View Full-Text via DOI View Full-Text via Web of Science View Full-Text via Scopus
引用统计	被引频次[WOS]：30 [WOS记录] [WOS相关记录]
Document Type	Journal article
专题	University of Macau
Affiliation	1.City University of Hong Kong 2.Pusan National University
推荐引用方式 GB/T 7714	Zhang X.L.,Hui K.N.,Hui K.S.,et al. Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering[J]. Materials Research Bulletin,2013,48(3):1093-1098.
APA	Zhang X.L.,Hui K.N.,Hui K.S.,&Singh J..(2013).Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering.Materials Research Bulletin,48(3),1093-1098.
MLA	Zhang X.L.,et al."Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering".Materials Research Bulletin 48.3(2013):1093-1098.