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Synthesis and properties of crystalline TiO 2 films deposited by a HIPIMS technique
Wang Q.M.1; Kwon S.-H.1; Hui K.N.1; Kim D.-I.1; Hui K.S.2; Kim K.H.1
2013-03-01
Source PublicationVacuum
Volume89
Issue1
Pages90-95
AbstractCrystalline TiO thin films were synthesized on the Si and glass substrates by reactive sputtering in a HIPIMS coating system. The films with a bit oxygen deficiency were deposited on the Si and glass substrates at oxygen flux rate of 10 sccm. The phase structure of the films changed with varying the parameters the MPP power pulse, the bias voltage, and working gas pressure. Anatase-dominant, anatase-rutile, and rutile films can be obtained by controlling the deposition parameters. The anatase-dominant and anatase-rutile TiO films possess good photoinduced hydrophilicity and photocatalytic properties. The rutile films exhibited high dielectric constant. The related mechanism and potential application was discussed. © 2011 Elsevier Ltd. All rights reserved.
KeywordDielectric constant High power impulse magnetron sputtering Phase structure Photocatalytic properties TiO 2film
DOI10.1016/j.vacuum.2011.11.020
URLView the original
Language英語
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Cited Times [WOS]:21   [WOS Record]     [Related Records in WOS]
Document TypeConference paper
CollectionUniversity of Macau
Affiliation1.Pusan National University
2.City University of Hong Kong
3.Guangdong University of Technology
Recommended Citation
GB/T 7714
Wang Q.M.,Kwon S.-H.,Hui K.N.,et al. Synthesis and properties of crystalline TiO 2 films deposited by a HIPIMS technique[C],2013:90-95.
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