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Microstructural, optical, and electrical properties of Ni-Al co-doped ZnO films prepared by DC magnetron sputtering
Jo Y.D.1; Hui K.N.1; Hui K.S.2; Cho Y.R.1; Kim K.H.1
2014-03-01
Source PublicationMaterials Research Bulletin
ISSN00255408
Volume51Pages:345-350
AbstractNi-Al co-doped ZnO (NiAl:ZnO) films with fixed Al content at 2 wt% and different Ni contents (2.5, 3, and 5 wt%) were deposited by DC magnetron sputtering in an argon atmosphere at room temperature. X-ray diffraction revealed that all films showed a highly preferential (0 0 2) c-axis orientation. XPS revealed the presence of metallic Ni, NiO, and NiO states, and Ni atoms were successfully doped in NiAl:ZnO films, which did not result in a change in ZnO crystal structure and orientation. The electrical resistivity of NiAl:ZnO film was decreased to 2.59 × 10 Ω cm at a Ni doping concentration of 3 wt% compared with undoped Al-doped ZnO film (5.58 × 10 Ω cm). The mean optical transmittance in the visible range was greater than 80% for all films. Band gap widening (4.18 eV) was observed in the NiAl:ZnO films with 5 wt% Ni, attributed to the Burstein-Moss shift due to the increase of carrier concentration. © 2013 Elsevier Ltd.
KeywordA. Composites A. Thin films B. Sputtering C. X-ray diffraction D. Optical properties
DOI10.1016/j.materresbull.2013.12.026
URLView the original
Language英語
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Cited Times [WOS]:12   [WOS Record]     [Related Records in WOS]
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Pusan National University
2.Hanyang University
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GB/T 7714
Jo Y.D.,Hui K.N.,Hui K.S.,et al. Microstructural, optical, and electrical properties of Ni-Al co-doped ZnO films prepared by DC magnetron sputtering[J]. Materials Research Bulletin,2014,51:345-350.
APA Jo Y.D.,Hui K.N.,Hui K.S.,Cho Y.R.,&Kim K.H..(2014).Microstructural, optical, and electrical properties of Ni-Al co-doped ZnO films prepared by DC magnetron sputtering.Materials Research Bulletin,51,345-350.
MLA Jo Y.D.,et al."Microstructural, optical, and electrical properties of Ni-Al co-doped ZnO films prepared by DC magnetron sputtering".Materials Research Bulletin 51(2014):345-350.
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