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Differential microstrip bandpass filter with dual-band responses using parallel-coupled line structure
Yang L.; Cheong P.; Choi W.-W.; Tam K.-W.
2012-12-01
Conference NameAsia-Pacific Microwave Conference (APMC)
Source PublicationAsia-Pacific Microwave Conference Proceedings, APMC
Pages28-30
Conference DateDEC 04-07, 2012
Conference PlaceKaohsiung, TAIWAN
CountryTaiwan,China
Author of SourceIEEE
Publication Place345 E 47TH ST, NEW YORK, NY 10017 USA
PublisherIEEE
Abstract

In this paper, a novel differential bandpass filter (BPF) with dual-band filtering response is proposed. The equivalent circuits of proposed dual-band filter are illustrated and analyzed in both differential-mode and common-mode. By controlling the electrical length of an open stub in the differential-mode, two passbands operating at the desired frequency ratio can be designed. Also, the spurious response within the passbands can be suppressed by the over-coupling technique. In the common-mode operation, the short-ended meander line enhances the common-mode suppression. From the measurement results, the dual-band BPF operates at 854 MHz and 2.40 GHz, with 3-dB fractional bandwidth 7.17% and 3.71% respectively. A transmission zero is recorded at 1.79 GHz to suppress the spurious passband. The measured common-mode suppression is better than 18.5 dB in two passbands is achieved. © 2012 IEEE.

KeywordCommon-mode Suppression Differential Filter Dual-band Reactive Load
DOI10.1109/APMC.2012.6421487
URLView the original
Indexed BySCI
Language英语
WOS Research AreaTelecommunications
WOS SubjectTelecommunications
WOS IDWOS:000319213700010
Fulltext Access
Citation statistics
Cited Times [WOS]:1   [WOS Record]     [Related Records in WOS]
Document TypeConference paper
CollectionDEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING
AffiliationUniversidade de Macau
Recommended Citation
GB/T 7714
Yang L.,Cheong P.,Choi W.-W.,et al. Differential microstrip bandpass filter with dual-band responses using parallel-coupled line structure[C]//IEEE. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2012:28-30.
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