UM
Catalytic growth of large area monolayer molybdenum disulfide film by chemical vapor deposition
Li, H.1,2; Zhang, X. H.1; Tang, Z. K.2
2019-01
Source PublicationTHIN SOLID FILMS
ISSN0040-6090
Volume669Pages:371-376
AbstractLarge area monolayer molybdenum disulfide (MoS2) film grown on silica/silicon substrate was synthesized using a catalyst perylene-3, 4, 9, 10-tetracarboxylic acid tetrapotassium salt (PTAS) by the method of chemical vapor deposition. The properties of the monolayer MoS2 film were characterized using a number of techniques. The optical microscope images show the film is uniform and continuous on a large scale. The 0.7 nm film thickness measured by atomic force microscope, as well as the difference of 20 cm(-1) between the two characteristic Raman peaks, all prove that the film is single layer. The strong photoluminescence spectrum and image as well as the x-ray diffraction indicate that the monolayer MoS2 film has a good quality. The MoS2 film synthesized under the same conditions without PTAS was also characterized as a comparison. The results show that the MoS2 film tends to thicker without using PTAS, suggesting that PTAS can not only promote the formation of the MoS2 seeding, but also induce horizontal growth of the MoS2 film on the substrate.
KeywordMonolayer Molybdenum disulfide Chemical vapor deposition
DOI10.1016/j.tsf.2018.10.055
URLView the original
Indexed BySCI
Language英语
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS IDWOS:000453405600052
PublisherELSEVIER SCIENCE SA
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Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Guangdong, Peoples R China;
2.Univ Macau, Inst Appl Phys & Mat Engn, Ave Univ, Taipa 999078, Macau, Peoples R China
First Author AffilicationUniversity of Macau
Recommended Citation
GB/T 7714
Li, H.,Zhang, X. H.,Tang, Z. K.. Catalytic growth of large area monolayer molybdenum disulfide film by chemical vapor deposition[J]. THIN SOLID FILMS,2019,669:371-376.
APA Li, H.,Zhang, X. H.,&Tang, Z. K..(2019).Catalytic growth of large area monolayer molybdenum disulfide film by chemical vapor deposition.THIN SOLID FILMS,669,371-376.
MLA Li, H.,et al."Catalytic growth of large area monolayer molybdenum disulfide film by chemical vapor deposition".THIN SOLID FILMS 669(2019):371-376.
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