UM
Research on preparation of nanoparticle monolayer masks and nanolithography
Wang Y.2; Yang M.1; Zhang X.1; Cai B.2; Xu D.2; Zhang Y.2
2005-07-01
Source PublicationZhongguo Jixie Gongcheng/China Mechanical Engineering
ISSN1004132X
Volume16Issue:SUPPL.Pages:391-393
AbstractThis paper described the nanolithography technique utilizing FePt nanoparticles as etch masks for the fabrication of silicon pattern. The high density and large area arrangement of FePt nanoparticle monolayer on the silicon substrate was prepared by Langmuir-Blodgett (LB) technique. Subsequent patterned silicon pillars were formed by reactive ion etching. The results indicate that the control conditions of reactive ion etching are a promising method for preparing nanodot and nanopillars (< 50 nm) using FePt nanoparticles as etch masks.
KeywordLangmuir-blodgett (LB) Mask Nanolithography Nanoparticle
URLView the original
Language英語
Fulltext Access
Document TypeJournal article
CollectionUniversity of Macau
Affiliation1.Baoding Galaxy Electronic Technology Co. Ltd.
2.Shanghai Jiao Tong University
Recommended Citation
GB/T 7714
Wang Y.,Yang M.,Zhang X.,et al. Research on preparation of nanoparticle monolayer masks and nanolithography[J]. Zhongguo Jixie Gongcheng/China Mechanical Engineering,2005,16(SUPPL.):391-393.
APA Wang Y.,Yang M.,Zhang X.,Cai B.,Xu D.,&Zhang Y..(2005).Research on preparation of nanoparticle monolayer masks and nanolithography.Zhongguo Jixie Gongcheng/China Mechanical Engineering,16(SUPPL.),391-393.
MLA Wang Y.,et al."Research on preparation of nanoparticle monolayer masks and nanolithography".Zhongguo Jixie Gongcheng/China Mechanical Engineering 16.SUPPL.(2005):391-393.
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